Field Guide to Optical Lithography
Available
 
About the Book
The material in this Field Guide is a distillation of material put together by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. This Field Guide details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. An introduction to next-generation lithographic technologies is also included, as well as an extensive lithography glossary and a summation of salient equations critical to anyone involved in the lithography industry.

Contents

- Symbol Glossary
- The Lithgraphy Process
- Image Formation
- Imaging into a Photoresist
- Photoresist Chemistry
- Lithography Control and Optimization
- Equation Summary
- Glossary
- Index

Book Details
ISBN-13: 9780819462077
EAN:
Acedemic Level: Academic_Level
Bood Data Readership Text: Professional & Vocational
Continuations: English
Edition: illustrated ed
Height: 199 mm
Language: English
No of Pages: 136
Returnable: Y
Spine Width: 9 mm
Width: 149 mm
ISBN-10: 0819462071
Publisher: Spie Press
Binding: Spiral bound
Book Type: Academic_Level
Depth: 13
Gardner Classification Code: K00
Illustrations: Illustrations
LCCN: 2005034584
Pagination: 136 pages, Illustrations
Series Title: Field Guide
UK Availability: GXC